Monthly Archives: Thursday November 3rd, 2011

Workshop at DATE ’12: Variability modelling and mitigation techniques in current and future technologies (VAMM)

Posted on Thursday November 3rd, 2011 by Christian Pilato

The influence of process variations is becoming extremely critical for nanoCMOS technology nodes, due to geometric tolerances and manufacturing non-idealities (such as edge or surface roughness, or the fluctuation of the number of doping atoms). As a result, production yields … Continue reading →

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